Work

Low-voltage electron-beam lithography linked to photolithography

Year: 1995

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.209178

Authors: Lothar Bauch, Monika Boettcher, Ulrich Haak, Ulrich A. Jagdhold

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Bundesministerium für Forschung und Technologie

OpenAlex ID: W2007100303

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