Work

Role of the hydrogen plasma treatment in layer-by-layer deposition of microcrystalline silicon

Year: 1997

Type: article

Source: Applied Physics Letters

DOI: 10.1063/1.120324

Authors: K. Saitoh, M. Kondo, M. Fukawa, T. Nishimiya, A. Matsuda, W. Futako, I. Shimizu

Institution: Tokyo Institute of Technology

Language: English

Topic: Thin-Film Transistor Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2007113660

FWCI: 6.25

Cites: 13

Cited by: 64

Related to: 10