Work

Elemental B distributions and clustering in low-energy B+ ion-implanted Si

Year: 2000

Type: article

Source: Applied Physics Letters

DOI: 10.1063/1.1328768

Authors: T.-S. Wang, A. G. Cullis, E. J. H. Collart, A. J. Murrell, M. A. Foad

Institutions: University of Sheffield, Applied Materials (United Kingdom), Applied Materials (United States)

Language: English

Topic: Ion-surface interactions and analysis

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2007241394

FWCI: 3.59

Cites: 17

Cited by: 19

Related to: 10