Year: 2006
Type: article
Abstract: Utilizing a high quality factor (Q∼1.5×106) optical microresonator to provide sensitivity down to a fractional surface optical loss of αs′∼10−7, we show that the optical loss within Si microphotonic components can be dramatically altered by Si surface preparation, with αs′∼1×10−5 measured for chemical oxide surfaces as compared to αs′⩽1×10−6 for hydrogen-terminated Si surfaces. These results indicate that the optical properties of Si surfaces can be significantly and reversibly altered by standard microelectronic treatments, and that stable, high optical quality surface passivation layers will be critical in future Si micro- and nanophotonic systems.
Source: Applied Physics Letters
DOI: 10.1063/1.2191475
Institution: California Institute of Technology
Language: English
Topic: Photonic and Optical Devices
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: green
OpenAlex ID: W2007346216