Temperature- and Al/N ratio-dependent AlN seed layer formation on (110) Si substrates by using plasma-assisted molecular beam epitaxy
Year: 2014
Type: article
DOI: 10.3938/jkps.64.1577
Institutions: Hanyang University, Chungnam National University
Language: English
Subfield: Condensed Matter Physics
Field: Physics and Astronomy
Domain: Physical Sciences
Open Access status: closed
Funder: Hanyang University
OpenAlex ID: W2007357912
