Transparent Titanium Dioxide Thin Film Deposited by Plasma-enhanced Atomic Layer Deposition
Year: 2006
Type: article
Source: Integrated ferroelectrics
Authors: G. X. LIU, F. K. SHAN, W. J. LEE, G. H. LEE, I. S. KIM, B. C. SHIN, S. G. YOON, C. R. CHO
Institutions: Dong-Eui University, Chungnam National University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2007415420