Work

Influence of ion energy on the physical properties of plasma deposited SiO2 reset films

Year: 1993

Type: article

Source: Applied Physics Letters

DOI: 10.1063/1.108973

Authors: O. Joubert, R. Burke, L. Vallier, C. Martinet, R. A. B. Devine

Institutions: Centre National de la Recherche Scientifique, Université Joseph Fourier, Orange (France)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2007485203

FWCI: 7.688

Cites: 11

Cited by: 35

Related to: 10