Advanced electron-beam writing system EX-11 for next-generation mask fabrication
Year: 1999
Type: conference-paper
DOI: 10.1117/12.360219
Authors: Toru Tojo, Ryoji Yoshikawa, Yoji Ogawa, Shuichi Tamamushi, Yoshiaki Hattori, Souji Koikari, Hideo Kusakabe, Takayuki Abe, Munehiro Ogasawara, Kiminobu Akeno, Hirohito Anze, Kiyoshi Hattori, Ryoichi Hirano, Shusuke Yoshitake, Tomohiro Iijima, Kenji Ohtoshi, Kazuto Matsuki, Naoharu Shimomura, Noboru Yamada, Hitoshi Higurashi, Noriaki Nakayamada, Yuuji Fukudome, Shigehiro Hara, Eiji Murakami, Takashi Kamikubo, Yasuo Suzuki, Susumu Oogi, Mitsuko Shimizu, Shinsuke Nishimura, Hideyuki Tsurumaki, Satoshi Yasuda, Kenji Ooki, Kiyomi Koyama, Susumu Watanabe, Mitsuhiro Yano, Hiroaki Suzuki, Hiroshi Hoshino, Masaki Toriumi, Osamu Watanabe, Kazuo Tsuji, Mitsunobu Katayama, Seiichi Tsuchiya, Kimio Suzuki, Shiro Kurasawa, Kazuyuki Okuzono, Hirokazu Yamada, Koji Handa, Yoshio Suzuki, Tetsu Akiyama, Yoshiaki Tada, Akira Noma, Tadahiro Takigawa
Institutions: Toshiba (Japan), Toshiba Machine (Japan)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2007602268