Work

Removal of oxide films from silicon surfaces in a high vacuum system: an in situ ellipsometric study

Year: 1976

Type: article

Source: Surface Science

DOI: 10.1016/0039-6028(76)90468-4

Authors: M.A. Hopper, R.A. Clarke, L. Young

Institution: University of British Columbia

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2007644962

FWCI: 3.435

Cites: 23

Cited by: 19

Related to: 10