Work

Assessment of a hypothetical roadmap that extends optical lithography through the 70-nm technology node

Year: 1998

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.332837

Authors: John S. Petersen, Martin McCallum, Nishrin Kachwala, Robert J. Socha, J. Fung Chen, Thomas L. Laidig, Bruce W. Smith, Ronald L. Gordon, Chris A. Mack

Institutions: ON Semiconductor (United States), Rochester Institute of Technology

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2008239963

FWCI: 7.703

Cites:

Cited by: 15

Related to: 10