Work

Using diode laser spectroscopy to evaluate techniques for acceleration of etch chamber evacuation

Year: 1996

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/1.579939

Authors: James J. F. McAndrew, Ronald S. Inman

Institution: Air Liquide (United States)

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2008317795

FWCI: 0.932

Cites:

Cited by: 9

Related to: 10