Work

Development of layout split algorithms and printability evaluation for double patterning technology

Year: 2008

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.773107

Authors: Tsann-Bim Chiou, Robert Socha, Hong Chen, Luoqi Chen, Stephen Hsu, Peter Nikolsky, Anton van Oosten, Alek C. Chen

Institutions: ASML (United States), ASML (Netherlands)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W2009102457

FWCI: 11.37

Cites:

Cited by: 37

Related to: 10