Study on Atomic Layer Deposition of Amorphous Rhodium Oxide Thin Films
Year: 2009
Type: article
DOI: 10.1149/1.3190157
Institutions: University of Helsinki, Helmholtz-Zentrum Dresden-Rossendorf
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
Funders: Helsingin Yliopisto, Tekes
OpenAlex ID: W2009455372