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Fabrication of three-dimensional microstructures by high resolution x-ray lithography

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Year: 1999
Type: article
Source: Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena
DOI: 10.1116/1.591027
Authors: C. Cuisin, Y. Chen, D. Decanini, A. Chelnokov, F. Carcenac, A. Madouri, J. M. Lourtioz, H. Launois
Institution: Centre National de la Recherche Scientifique
Language: English

Topic: Advancements in Photolithography Techniques
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences

Open Access status: closed

Funders: Centre National de la Recherche Scientifique, Conseil National de la Recherche Scientifique
OpenAlex ID: W2009487388
FWCI: 1.775
Cites: 14
Cited by: 17
Related to: 10
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