Work

MSB for ILT masks

Year: 2011

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.896883

Authors: Juergen Gramss, Ulf Weidenmueller, Arnd Stoeckel, Renate Jaritz, Hans-Joachim Doering, Monika Boettcher

Institution: Vistec Electron Beam (Germany)

Language: German

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2009592274

FWCI:

Cites:

Cited by:

Related to: 10