Transparent p-type SnOx thin film transistors produced by reactive rf magnetron sputtering followed by low temperature annealing
Year: 2010
Type: article
Source: Applied Physics Letters
DOI: 10.1063/1.3469939
Authors: Elvira Fortunato, Raquel Barros, Pedro Barquinha, Vitor Figueiredo, Sang-Hee Ko Park, Chi-Sun Hwang, Rodrigo Martins
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2009623906