Work

Characterization of a large volume electron cyclotron resonance plasma for etching and deposition of materials

Year: 1992

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/1.578239

Authors: A. Ghanbari, M. S. Ameen, R. S. Heinrich

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Division of Materials Research

OpenAlex ID: W2010212409

FWCI: 2.318

Cites:

Cited by: 10

Related to: 10