Work

Novel stacked capacitor technology for 1-Gbit DRAMs with (Ba,Sr)TiO3 thin films

Year: 1997

Type: article

Source: Electronics and Communications in Japan (Part II Electronics)

DOI: 10.1002/(sici)1520-6432(199705)80:5<70::aid-ecjb10>3.0.co;2-3

Authors: Tsuyoshi Horikawa, Teruo Shibano, Takaaki Kawahara, Tetsuro Makita, Takeharu Kuroiwa, Mikio Yamamuka, Tatsuo Oomori, Noboru Mikami, Kouichi Ono, Akimasa Yuuki

Institution: Mitsubishi Electric (Japan)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Affordable and clean energy

Open Access status: closed

OpenAlex ID: W2010310296

FWCI: 0.481

Cites:

Cited by: 3

Related to: 10