Work

4 inch lift-off process by trilayer nanoimprint lithography

Year: 2005

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

DOI: 10.1116/1.2130351

Authors: J. Tallal, K. Berton, M. Gordon, D. Peyrade

Institutions: Centre National de la Recherche Scientifique, Laboratoire des Technologies de la Microélectronique

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2010458555

FWCI: 0.481

Cites: 17

Cited by: 15

Related to: 10