Work

Effect of Tantalum Addition on Optical Transmittance and Electrical Resistivity of TiN Thin Films Prepared by d.c. Magnetron Sputtering

Year: 2001

Type: article

Source: Key engineering materials

DOI: 10.4028/www.scientific.net/kem.206-213.523

Authors: O. Bourbia, S. Achour, S. Zerkout, M. Benkahoul, Abdelhamid Harabi

Institution: University Frères Mentouri Constantine 1

Language: English

Topic: Metal and Thin Film Mechanics

Subfield: Mechanics of Materials

Field: Engineering

Domain: Physical Sciences

Open Access status: hybrid

OpenAlex ID: W2010575830

FWCI:

Cites:

Cited by: 2

Related to: 10