Work

Smooth, low-bias plasma etching of InP in microwave Cl2/CH4/H2 mixtures

Year: 1992

Type: article

Source: Applied Physics Letters

DOI: 10.1063/1.108042

Authors: C. Constantine, C. Barratt, S. J. Pearton, F. Ren, J. R. Lothian

Institution: AT&T (United States)

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2010754335

FWCI: 6.026

Cites: 16

Cited by: 50

Related to: 10