Work

Interfacial reactions of Co/Si0.76Ge0.24 and Co(Si0.76Ge0.24)/Si0.76Ge0.24 by pulsed KrF laser annealing

Year: 1999

Type: article

Source: Journal of materials research/Pratt's guide to venture capital sources

DOI: 10.1557/jmr.1999.0464

Authors: Jian-Shing Luo, Yu-Lin Hang, Wen-Tai Lin, C. Y. Chang, P. S. Shih

Institutions: National Cheng Kung University, National Yang Ming Chiao Tung University

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2010800899

FWCI: 0.673

Cites: 29

Cited by: 7

Related to: 10