Work

Enhancement of the deposition rate of a-Si:H by introduction of an electronegative molecule into a silane discharge

Year: 1996

Type: article

Source: Journal of Non-Crystalline Solids

DOI: 10.1016/0022-3093(96)00016-6

Authors: Toru Ikeda, Ian S. Osborne, Nobuhiro Hata, Akihisa Matsuda

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2010831980

FWCI: 0.97

Cites: 5

Cited by: 13

Related to: 10