Work

High Rate Deposition of Microcrystalline Silicon Using Conventional Plasma-Enhanced Chemical Vapor Deposition

Year: 1998

Type: article

Source: Japanese Journal of Applied Physics

DOI: 10.1143/jjap.37.l1116

Authors: Lihui Guo, Michio Kondo, Makoto Fukawa, Kimihiko Saitoh, Akihisa Matsuda

Language: English

Topic: Thin-Film Transistor Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2011413488

FWCI: 8.988

Cites: 12

Cited by: 220

Related to: 10