Work

The physics of ONO layer dielectrics

Year: 1989

Type: article

Source: Applied Surface Science

DOI: 10.1016/0169-4332(89)90433-9

Authors: A. Spitzer, R. Baunach

Institution: Siemens (Germany)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2011616059

FWCI: 0.922

Cites: 13

Cited by: 17

Related to: 10