Strong uniaxial magnetic anisotropy in CoFe films on obliquely sputtered Ru underlayer
Year: 2009
Type: article
Source: Journal of Applied Physics
DOI: 10.1063/1.3223538
Institutions: University of Alabama, Hitachi Maxell (Japan), Hitachi (Japan)
Language: English
Subfield: Atomic and Molecular Physics, and Optics
Field: Physics and Astronomy
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2011645504