Work

Residual stress in low pressure chemical vapor deposition SiNx films deposited from silane and ammonia

Year: 1998

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/1.581302

Authors: P. Temple-Boyer, C. Rossi, E. Saint-Etienne, E. Scheid

Institutions: Centre National de la Recherche Scientifique, Laboratoire d'Analyse et d'Architecture des Systèmes

Language: English

Topic: Metal and Thin Film Mechanics

Subfield: Mechanics of Materials

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2012084735

FWCI: 2.53

Cites: 22

Cited by: 181

Related to: 10