Work

RBS analysis of Si diffusion in photoresist during silylation

Year: 1990

Type: article

Source: Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms

DOI: 10.1016/0168-583x(90)90820-k

Authors: P. Madakson, S. Nunes, E. Galligan, R. McGouey, N. Chou

Institution: IBM Research - Thomas J. Watson Research Center

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2012120995

FWCI:

Cites:

Cited by: 1

Related to: 10