Work

Comparison of the removal efficiency for organic contaminants on silicon wafers stored in plastic boxes between UV/O3 and ECR oxygen plasma cleaning methods

Year: 2003

Type: article

Source: Thin Solid Films

DOI: 10.1016/s0040-6090(03)00329-8

Authors: Kyunsuk Choi, Tae-Jong Eom, Chongmu Lee

Institution: Inha University

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Responsible consumption and production

Open Access status: closed

OpenAlex ID: W2012481534

FWCI: 1.632

Cites: 8

Cited by: 41

Related to: 9