Work

Lateral quantum dots in Si/SiGe realized by a Schottky split-gate technique

Year: 2006
Type: article
Abstract: A Schottky split gate technique is used to form lateral quantum dots in the two-dimensional electron gases of a high-mobility Si/SiGe heterostructure. e-beam defined palladium gates show Schottky barriers with very well controlled leakage currents. At low temperatures we observe Coulomb-blockade and stability diamonds on lateral quantum dots containing less than 25 electrons. The experiments demonstrate that, in contrast to recent reports, Schottky gates are a feasible approach for the fabrication and integration of single electron transistors in the strained Si/SiGe heterostructure.
Language: English
Open Access status: bronze
OpenAlex ID: W2012492007
FWCI: 0.485
Cites: 11
Cited by: 3
Related to: 10