Work

Correlation of in-plane and out-of-plane distortion in x-ray lithography masks

Year: 1992

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

DOI: 10.1116/1.585905

Authors: Y. C. Ku, Michael H. Lim, J. M. Carter, M. K. Mondol, A. Moel, Henry I. Smith

Institution: Massachusetts Institute of Technology

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Semiconductor Research Corporation

OpenAlex ID: W2013156221

FWCI: 1.404

Cites:

Cited by: 5

Related to: 10