Work

Effect of substrate bias and oxygen partial pressure on properties of RF magnetron sputtered HfO2 thin films

Year: 2013

Type: article

Source: Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

DOI: 10.1116/1.4825234

Authors: Sk. Maidul Haque, Pankaj R. Sagdeo, Shanmugam Balaji, Kalavathi Sridhar, Sanjiv Kumar, Debarati Bhattacharyya, Dibyendu Bhattacharyya, Naba K. Sahoo

Institutions: Bhabha Atomic Research Centre, Indian Institute of Technology Indore, Indira Gandhi Centre for Atomic Research, National Centre for Compositional Characterisation of Materials

Language: English

Topic: Optical Coatings and Gratings

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2013724540

FWCI: 2.234

Cites: 44

Cited by: 28

Related to: 10