Work

Interfacial reactions of Ni on Si0.76Ge0.24 and Si by pulsed laser annealing

Year: 1998

Type: article

Source: Materials Chemistry and Physics

DOI: 10.1016/s0254-0584(98)00024-8

Authors: Jian-Shing Luo, Wen-Tai Lin, C.Y. Chang, W.C. Tsai

Institutions: National Cheng Kung University, National Yang Ming Chiao Tung University

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

Funder: National Science Council

OpenAlex ID: W2014092977

FWCI: 0.733

Cites: 23

Cited by: 15

Related to: 10