Work

Compact model experimental validation for grapho-epitaxy hole processes and its impact in mask making tolerances

Year: 2014

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.2065840

Authors: Germain Fenger, J. Andres Torres, Yuansheng Ma, Yuri Granik, Polina Krasnova, Antoine Fouquet, Jérôme Belledent, Ahmed Gharbi, Raluca Tiron

Institutions: Mentor Graphics (United States), Commissariat à l'Énergie Atomique et aux Énergies Alternatives, Laboratoire d'Électronique des Technologies de l'Information

Language: English

Topic: Block Copolymer Self-Assembly

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2014340916

FWCI: 9.086

Cites: 6

Cited by: 8

Related to: 10