Work

Reticle inspection system using DUV wavelength and new alogorithm platform for advanced reticle inspection for 0.13-μm technology node

Year: 2000

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.392087

Authors: David S. Alles, Paul Terbeek, Shauh-Teh Juang, James N. Wiley, Kangmin Hsia

Institutions: KLA (United States), Intel (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W2014505486

FWCI: 0.956

Cites:

Cited by: 2

Related to: 10