Mask characterization for CDU budget breakdown in advanced EUV lithography
Year: 2012
Type: conference-paper
DOI: 10.1117/12.970395
Authors: Peter Nikolsky, Chris Strolenberg, Rasmus Nielsen, Tjitte Nooitgedacht, Natalia Davydova, Greg Yang, Shawn Lee, Chang-Min Park, Insung Kim, Jeong-Ho Yeo
Institutions: ASML (Netherlands), Samsung Electronics (South Korea)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
Funder: Samsung
OpenAlex ID: W2014523899