Work

Diffusion phenomena in a Pt/IrO2/Ir/TiN/W multilayer structure during annealing in oxygen

Year: 2004

Type: article

Source: Applied Physics Letters

DOI: 10.1063/1.1638899

Authors: A. Alberti, A. M. Borzı̀, S. Ravesi

Institutions: Institute for Microelectronics and Microsystems, STMicroelectronics (Italy)

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2015437384

FWCI: 0.2

Cites: 7

Cited by: 1

Related to: 10