Work

SADP for BEOL using chemical slimming with resist mandrel for beyond 22nm nodes

Year: 2012

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.916952

Authors: Linus Jang, Sudhar Raghunathan, E. Todd Ryan, Jongwook Kye, Harry J. Levinson, Shannon Dunn, David Hetzer, Shinichiro Kawakami, Lior Huli

Institutions: GlobalFoundries (United States), Tokyo Electron (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2015469459

FWCI: 2.031

Cites: 1

Cited by: 7

Related to: 10