Work

Effect of ion bombardment on low-temperature growth of TiO 2 thin films in DC reactive sputtering with two sputtering sources

Year: 2012

Type: article

Source: Surface and Coatings Technology

DOI: 10.1016/j.surfcoat.2012.01.003

Authors: Yoji Yasuda, Masayuki Tobisaka, Kento Kamikuri, Yoichi Hoshi

Institution: Tokyo Polytechnic University

Language: English

Topic: TiO2 Photocatalysis and Solar Cells

Subfield: Renewable Energy, Sustainability and the Environment

Field: Energy

Domain: Physical Sciences

Open Access status: closed

Funder: Japan Society for the Promotion of Science

Award: Development of low damage high rate sputter-deposition process for the fabrication of OLED

OpenAlex ID: W2015546166

FWCI: 0.4

Cites: 23

Cited by: 8

Related to: 10