Work

Effect of hydrogen on passivation quality of SiNx/Si-rich SiNx stacked layers deposited by catalytic chemical vapor deposition on c-Si wafers

Year: 2014

Type: article

Source: Thin Solid Films

DOI: 10.1016/j.tsf.2014.10.016

Authors: Trinh Cham Thi, Koichi Koyama, Keisuke Ohdaira, Hideki Matsumura

Institutions: Japan Advanced Institute of Science and Technology, Japan Science and Technology Agency

Language: English

Topic: Silicon and Solar Cell Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: bronze

Funders: Japan Science and Technology Agency, Core Research for Evolutional Science and Technology

OpenAlex ID: W2015692898

FWCI: 1.135

Cites: 7

Cited by: 20

Related to: 10