Effects of process variation in VLSI interconnects – a technical review
Year: 2009
Type: article
Source: Microelectronics International
Authors: K.G. Verma, B.K. Kaushik, R. Singh
Institution: Shobhit University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2015764893