Work

Advanced RELACS Technology for ArF Resist

Year: 2003

Type: article

Source: Journal of Photopolymer Science and Technology

DOI: 10.2494/photopolymer.16.507

Authors: Mamoru Terai, Toshiyuki Toyoshima, Takeo Ishibashi, Shinji Tarutani, Kiyohisa Takahashi, Yusuke Takano, Hatsuyuki Tanaka

Institutions: Mitsubishi Electric (Japan), Clariant (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: diamond

OpenAlex ID: W2015808005

FWCI: 1.655

Cites: 3

Cited by: 7

Related to: 10