Laterally seeded epitaxy enhancement in zone melting recrystallisation by increase of silicon film thickness
Year: 1989
Type: article
Source: Electronics Letters
DOI: 10.1049/el:19890175
Authors: Lianjun Liu, Zhi Jiang, Pei-Hsin Tsien, Zhijian Li
Institution: Tsinghua University
Language: English
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2016007868
