Work

An automatic imaging spectroscopic ellipsometer for characterization of nano‐film pattern on solid substrate

Year: 2008

Type: article

Abstract: In order to characterize the physical and spatial properties of nano‐film pattern on solid substrates, an automatic imaging spectroscopic ellipsometer (ISE) based on a polarizer ‐ compensator ‐ specimen ‐ analyzer configuration in the visible region is presented. It can provide the spectroscopic ellipsometric parameters ψ (x, y, λ) and Δ (x, y, λ) of a large area specimen with a lateral resolution in the order of some microns. A SiO2 stepped layers pattern is used to demonstrate the function of the ISE which shows potential application in thin film devices such as high‐throughput bio‐chips. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

Source: Physica status solidi. C, Conferences and critical reviews/Physica status solidi. C, Current topics in solid state physics

DOI: 10.1002/pssc.200777784

Authors: Y. H. Meng, Y. Y. Chen, C. Qi, L. Liu, G. Jin

Institutions: Chinese Academy of Sciences, Institute of Mechanics, Suzhou Institute of Nano-tech and Nano-bionics

Language: English

Topic: Optical Polarization and Ellipsometry

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: green

Funders: National Natural Science Foundation of China, Chinese Academy of Sciences

OpenAlex ID: W2016074048

FWCI: 0.67

Cites: 14

Cited by: 7

Related to: 10