Work

Fabrication of thin film diodes using reactive sputtering

Year: 1963

Type: article

Source: Proceedings of the IEEE

DOI: 10.1109/proc.1963.2401

Author: P.J. Magill

Institution: IBM (United States)

Language: English

Topic: Advanced Materials and Semiconductor Technologies

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2016147881

FWCI: 1.399

Cites: 1

Cited by: 2

Related to: 10