Work

Fast RF-CV Characterization Through High-Speed 1-port S-Parameter Measurements

Year: 2012

Type: article

Source: IEEE Transactions on Semiconductor Manufacturing

DOI: 10.1109/tsm.2012.2202752

Authors: R. W. Herfst, P. G. Steeneken, M. P. J. Tiggelman, J. Stulemeijer, J. Schmitz

Institutions: NXP (Netherlands), ASML (Netherlands), University of Twente

Language: English

Topic: Microwave and Dielectric Measurement Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2016291416

FWCI: 0.6

Cites: 13

Cited by: 8

Related to: 10