Work

Sub-50 nm feature sizes using positive tone molecular glass resists for EUV lithography

Year: 2006

Type: article

Source: Journal of Materials Chemistry

DOI: 10.1039/b514065j

Authors: Seung Wook Chang, Ramakrishnan Ayothi, Daniel Bratton, Da Yang, Nelson Felix, Heidi B. Cao, Hai Deng, Christopher K. Ober

Institutions: Cornell University, Intel (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Intel Corporation

OpenAlex ID: W2016383392

FWCI: 8.859

Cites: 23

Cited by: 86

Related to: 10