Work

Consumables for the Chemical Mechanical Polishing (Cmp) of Dielectrics and Conductors

Year: 1994

Type: article

Source: MRS Proceedings

DOI: 10.1557/proc-337-121

Authors: Rahul Jairath, Mukesh Desai, Matt Stell, Robert Tolles, Debra Scherber-Brewer

Institution: IBM (United States)

Language: English

Topic: Advanced Surface Polishing Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2016942166

FWCI: 1.186

Cites: 3

Cited by: 49

Related to: 10