Work

New approach for 193-nm resist using modified cycloolefin resin

Year: 2002

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.474209

Authors: Joo Hyeon Park, Dong-Chul Seo, Chang-Min Kim, Young T. Lim, Seong D. Jo, Jong-Bum Lee, Hyeon S. Joo, Hyun P. Jeon, Seong-Ju Kim, Jae Chang Jung, Ki-Soo Shin, Keun-Kyu Kong, Tatsuya Yamada

Institutions: Kumho Petrochemical (South Korea), Nagase ChemteX (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2016983789

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