Work

Chromeless phase mask by resist silylation for i-line lithography

Year: 1993

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.150461

Authors: Lothar Bauch, Joachim J. Bauer, Monika Boettcher, Ulrich Haak, Wolfgang W. Hoeppner, Georg G. Mehliss

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2017052842

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